Technical Data: Photochemical Surface Treatment of Materials Using Vacuum Ultraviolet Excimer Lamps
Applications in various industrial fields are possible, such as light cleaning, light thin film formation, light modification, and photochemical modification!
The photochemical surface treatment method for materials using vacuum ultraviolet excimer lamps has characteristics such as "low cost" and "ease of large area processing." As a result, it can be applied to various industrial fields, including photonic cleaning, photonic thin film formation, photonic modification, and photochemical modification. This document presents the results of an investigation into the effects of photochemical surface treatment using atomic force microscopy (AFM). [Contents] ■ Introduction ■ Experiment ■ Results *For more details, please refer to the PDF document or feel free to contact us.
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**Characteristics of Light Surface Treatment Method Using Excimer Lamp** ■ Inexpensive: Uses relatively inexpensive discharge tubes, eliminating the need for costly lasers. ■ Simple: Can be processed in the atmosphere, so there is no need for cumbersome vacuum evacuation equipment. ■ Easy to process large areas: Uses discharge tubes that allow for easy large-area irradiation instead of highly directional lasers. ■ High-speed processing possible: The short wavelength of light and high photon energy, along with a high light output of several mW/cm², enable fast processing. ■ Room temperature processing possible: Ceramic thin film formation, which typically requires high-temperature firing, can be done at around room temperature. ■ Patterning possible: Using a contact-type photomask allows for micrometer-level patterning. ■ Material agnostic: The short wavelength and high photon energy of light can cut most chemical bonds. *For more details, please refer to the PDF document or feel free to contact us.*
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For more details, please refer to the PDF document or feel free to contact us.
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Quark Technology Co., Ltd. manufactures and sells various industrial equipment utilizing cutting-edge optical application technology. Through the development of vacuum ultraviolet and UV-LED light sources, we have introduced manufacturing technologies for semiconductor production, as well as new displays such as LCDs, PDPs, films, and EL, along with various electronic materials and devices. Additionally, we are planning research and development to address the demand for waste and environmental management equipment, which are pressing medical and social issues. All substances are composed of atoms, nucleons, and "quarks." At Quark Technology, we continue to research light and challenge ourselves in industrial application technologies.
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