Light-curable resin for nanoimprinting
NK Optimizer Series This is a photo-curable resin for nanoimprinting that applies the technology cultivated in the development and design of resist materials and optical materials. It is a photo-curable resin for nanoimprinting that can be used in sensing devices such as micro-lens arrays (MLA), diffractive optical elements (DOE), facial recognition devices, and mechless LiDAR, as well as AR/VR glasses. The "NL-S Series" offers high heat resistance and solder reflow grade. It provides materials that can be imprinted from low refractive index (nD1.35) to high refractive index (nD1.93). The "NL-N Series" is a refractive index adjustment material for optical components. The "NL-R1020" is a dry etching resistant grade essential for microfabrication, with a selectivity of 1.0 (Al2O3) and 0.6 (TiO2) proven. Various customizations are available to meet customer requirements. *For more details, please refer to the PDF materials or feel free to contact us.
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basic information
【Lineup】 ■NL-S1010, S1030, S1040, SX003 ■NL-N3432, N4646NF, N6226NF, NX003, N81X, N93X ■NL-R1020 etc. *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Applications】Nanoimprint, optical components ■MLA ■WLO ■DOE ■Displays ■Imaging & Sensing ■AR/MR waveguides ■Meta materials ■Silicon photonics ■Photonic Crystal etc. *For more details, please refer to the PDF document or feel free to contact us.*
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Company information
Shin Nakamura Chemical Industry Co., Ltd. has been engaged in the manufacture and sale of plant-based dyes since its founding in 1938, and has developed a business focused on the manufacture and sale of chemical products centered around acrylic resins. With close collaboration among research and development, manufacturing, sales, and quality assurance, we quickly respond to our customers' needs, so please feel free to contact us with any requests.
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