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  6. [Data] Structural Analysis of MEMS Components

[Data] Structural Analysis of MEMS Components

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last updated:Sep 17, 2021

アイテス
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Comprehensive analysis of the structure of MEMS components using a combination of non-destructive and destructive methods!

This document introduces the structural analysis of MEMS components. It includes "non-destructive observation of accelerometers" using X-ray tomography to observe the internal structure of the package, as well as "optical microscope and SEM observation after mechanical polishing of accelerometers" and "cross-sectional observation of microphones (CROSS BEAM FIB/SEM)." Please feel free to download and take a look. [Contents] ■ Non-destructive observation of accelerometers ■ Optical microscope and SEM observation after mechanical polishing of accelerometers ■ Cross-sectional observation of microphones (CROSS BEAM FIB/SEM) *For more details, please refer to the PDF document or feel free to contact us.

    Analysis and prediction system
スクリーンショット

[Data] Structural Analysis of MEMS Components

スクリーンショット 2021-09-16 103545.png
スクリーンショット 2021-09-16 103545.png
  • Related Link - https://www.ites.co.jp/structure/furyo.html

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Cross-beam FIB cross-sectional observation

Cross-beam FIB cross-sectional observation

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Total support service for cross-section grinding, processing, observation, and analysis.

Total support service for cross-section grinding, processing, observation, and analysis.

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X-ray fluoroscopy and CT examination device: Observation case of a microphone

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Cross-section polishing (CP) method for cross-sectional observation service.

Cross-section polishing (CP) method for cross-sectional observation service.

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Cross-section polishing service for implementation parts and electronic components.

Cross-section polishing service for implementation parts and electronic components.

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8-inch IC and MEMS foundry services launched.

8-inch IC and MEMS foundry services launched.

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Examples of semiconductor observation by mechanical polishing

Examples of semiconductor observation by mechanical polishing

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Examples of semiconductor observation using mechanical polishing.

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In the methods for cross-section preparation in semiconductor structural observation and defect analysis, CP, FIB, and mechanical polishing are mentioned, each having its own advantages and disadvantages, making it necessary to consider which method to use. In recent years, CP and FIB have become more common, and it seems that the use of mechanical polishing, which requires technical skill, is decreasing. However, it is still not to be dismissed. While there are merits and demerits, it is possible to achieve cross-section preparation with mechanical polishing that is comparable to FIB and CP. At our company, based on years of accumulated know-how, we propose the most appropriate processing methods according to the observation purpose and the composition and structure of the samples.

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Aites was established in 1993, originating from the quality assurance department of the IBM Japan Yasu office. Based on the technical expertise cultivated through cutting-edge defect analysis and reliability assurance of electronic components at the IBM Japan Yasu office, we have provided various products and services that support the development and manufacturing of semiconductors, displays, organic EL, solar cells, and electronic components to customers both domestically and internationally.

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