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  6. TOF-SIMS analysis of trace contaminants

TOF-SIMS analysis of trace contaminants

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last updated:Jun 01, 2020

アイテス
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The analysis sensitivity of TOF-SIMS is high at the ppm level, making it effective for analyzing trace contamination!

This is an introduction to a case where water droplet-shaped contaminants were created on a Si wafer through reproducibility experiments. Measurements were conducted at the same location using SEM-EDX and TOF-SIMS, and a comparison of the image maps was made. In the TOF-SIMS image map, organic substances (CH, CN), Na, and K were detected around the watermark. While no contaminants were observed around the watermark in the optical image, SEM image, and EDX analysis, the TOF-SIMS image map revealed that trace amounts of contaminants were present. *For more details, please refer to the PDF document or feel free to contact us.*

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2020-05-28_16h51_00.png

TOF-SIMS analysis of trace contaminants

2020-05-28_16h51_00.png
2020-05-28_16h51_00.png
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[Data] Analysis examples of low molecular weight organic acids using ion chromatography

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[Data] FT-IR Analysis of Transparent Resin

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[Example of TOF-SIMS] Analysis of Li

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[Example of TOF-SIMS] Wide-area image map

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Chemical Analysis Trust Service

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Chemical Analysis Trusted Service

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We would like to introduce our "Chemical Analysis - Trust Us Service." When conducting component analysis of foreign substances or stains on products, it can be challenging to determine whether organic analysis or inorganic analysis is more suitable, and which specific analysis within organic or inorganic is the most appropriate. We provide a comprehensive service for customers who are struggling with the selection of analysis methods. Since each analytical instrument is capable of measuring different targets, it is necessary to choose the method that fits the purpose based on the information available.

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Dynamic SIMS

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"Dynamic SIMS" is a secondary ion mass spectrometry method that can detect trace amounts of all elements (from H to U) in samples with high sensitivity, ranging from ppm to ppb. It allows for qualitative analysis and depth profiling, and additionally enables high-precision quantitative analysis using standard samples (conducted at our partner company's facility). The minimum beam diameter is approximately 30 µm, and it can be further reduced depending on the material.

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Aites was established in 1993, originating from the quality assurance department of the IBM Japan Yasu office. Based on the technical expertise cultivated through cutting-edge defect analysis and reliability assurance of electronic components at the IBM Japan Yasu office, we have provided various products and services that support the development and manufacturing of semiconductors, displays, organic EL, solar cells, and electronic components to customers both domestically and internationally.

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