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  6. There are also such abrasives! GC, DIA, and B4C are always in a dispersed state!

There are also such abrasives! GC, DIA, and B4C are always in a dispersed state!

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last updated:Jan 20, 2018

アウトラン
アウトラン
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In addition to the existing cerium, GC, DIA (MC/PC), and B4C have joined the group. The work and applications have expanded.

◎ Depending on the work and desired results, you can choose abrasives from GC, diamond (single crystal, polycrystalline), or boron. ◎ No need for slurry formulation, maintaining high dispersion for a long time. ◎ Produces a uniform polishing surface with minimal processing unevenness. ◎ Moderate viscosity makes it easy to supply to production lines, with no reduction in rate due to excessive dispersants. ◎ Prevents aggregation of fine particles, allowing effective abrasives to act for extended periods, reducing the amount of abrasives used and decreasing waste (industrial waste). ◎ No special cleaning solution is required; it can be cleaned with water. ◎ Can be easily used for on-site repair polishing. ◎ Please feel free to inquire about available concentrations and quantities.

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IMG_1106.JPG

There are also such abrasives! GC, DIA, and B4C are always in a dispersed state!

IMG_1106.JPG
IMG_1106.JPG
  • Related Link - http://outrunpolish.web.fc2.com/index.html

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basic information

Please refer to the following for the types: Cerium type (0.9μm/2.45μm/5.0μm) GC (13µm) Diamond (MC: 1.0μm/PC: 3.0μm) B4C (9μm) In sites using large equipment or multiple polishing machines, abrasives supplied in powder form are cost-effective, but non-settling slurry is optimal for small polishing machines and on-site repair work.

Price information

It varies depending on the concentration and quantity. Please feel free to contact us.

Delivery Time

Please contact us for details

※It varies depending on concentration and quantity. Please feel free to contact us.

Applications/Examples of results

- Glass polishing - Polishing of quartz, silicon wafers, hard metals, and cutting tools - Soft metals such as zinc and copper alloys, and glass for photomasks - High-speed polishing of brittle materials - Polishing of various metal materials, etc.

Company information

アウトラン

アウトラン

Building Management

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Regarding the processing of brittle materials, we leverage our extensive experience accumulated over the years (from equipment design and manufacturing to processing operations) to provide customers with the necessary polishing materials, grinding wheels, and processing materials for their "evolution." In particular, our cerium oxide polishing materials are characterized by a rich variety and grades that are "unique to us," as we understand the individual chemical properties of each product (from component composition to particle characteristics and zeta potential), ranging from high-purity cerium oxide as a rare earth to sintered and ceramicized cerium oxide polishing materials. Furthermore, we offer three forms—powder, slurry, and colloidal—and have established an online shop (https://www.outrun-polish58.jp/) where customers can purchase small quantities. Outrun aims to be a "one-stop service" for cerium polishing and continues to take on new challenges every day.

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