Aspect ratio 1:5 processing results! Can be used in a wide range of fields!
Our company is capable of processing using "high aspect ratio resist" with a high aspect ratio between pattern line width and film thickness (height). We have a proven track record of processing with an aspect ratio of 1:5. With this technology, the resist pattern becomes not just a protective film but a fine three-dimensional structure, expanding its range of applications. 【Features】 ■ Proven track record of processing with an aspect ratio of 1:5 ■ Wide range of applications *For more details, please refer to the catalog or feel free to contact us.
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【Applications】 ■Flow path ■Stamper ■Cell partition, etc. *For more details, please refer to the catalog or feel free to contact us.
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Applications/Examples of results
【Applications】 ■Flow path ■Stamper ■Cell partition, etc. *For more details, please refer to the catalog or feel free to contact us.
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Company information
Photo Precision Co., Ltd. is a company that contributes to prototyping and development in various fields, including microelectronics and optical products, with photofabrication as its core technology. Next-generation industrial core products such as MEMS (Micro Electro Mechanical Systems), biochips, and microchemical chips are formed by the complex application of technologies such as nanotechnology, three-dimensional micromachining, high-density three-dimensional packaging, and three-dimensional photolithography. Photofabrication is deeply involved in all of these technologies and serves as the foundational technology for MEMS development. We strive for continuous technical refinement with the support of our customers, while also introducing advanced equipment as much as possible to meet the diverse needs of our clients.