Low-temperature CVD allows for film formation at temperatures below 100°C and can also deposit films on substrates of various shapes and materials such as resins and films.
We offer contract processing for film deposition, focusing on SiO2 and SiN from PE=CVD. We can sometimes accommodate requests for thick thermal oxide films and a small number of thermal oxide films with our stock items, so please feel free to contact us. For more details, please download the catalog or contact us.
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basic information
【Features】 - Film formation is possible from a single sheet. - Low-temperature CVD allows film formation at temperatures below 100°C. - Film formation is also compatible with substrates of various shapes and sizes. - Film formation is possible on materials such as resins and films. - Substrates that have undergone patterning can also be processed. - Film formation can be adapted to different temperature conditions. - Thin film deposition can be processed with a variation of ±4% or less. For more details, please download the catalog or contact us.
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Company information
Omura Giken Co., Ltd. is a company engaged in machining, high-pressure/special gas piping, welding, assembly, design, and the regeneration and ancillary work of used semiconductor manufacturing equipment. Our refined technology is adopted in many industries that require precision, meticulousness, and safety, including the semiconductor industry, liquid crystal displays, fuel cells, eco-related fields, food factories, various manufacturing plants, pharmaceutical research institutes, and research organizations. Our motto is "Omura Giken when in trouble," and we strive to be more flexible, prompt, and advanced, always pursuing 100% customer satisfaction.
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