A lithography machine that aligns the glass mask and workpiece to transfer fine mask patterns.
We have both automatic and manual exposure machines available.
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basic information
The exposure equipment group, which has gathered the essence of innovative optical technology and lamp manufacturing techniques cultivated over many years, has achieved numerous results in the fields of electronics and printing. The newly developed optical systems, mirror technology, and highly efficient ultra-high-pressure mercury lamps and metal halide lamps create high-precision "parallel light" and support the development of cutting-edge technology with excellent cost performance. 【Single-Sided Mask Aligner】 ● Used in the exposure processes of various device fields, including semiconductor devices and various sensors. ● Ideal for research and development as well as small to medium lot production. 【Double-Sided Mask Aligner】 ● This mask aligner aligns glass masks and workpieces in photolithography processes for wafers and glass substrates, transferring fine mask patterns onto photoresist coated on the board through proximity and soft contact exposure. ■□■ For more details, please request materials or download the catalog ■□■
Price information
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Applications/Examples of results
●Main application areas Photolithography processes for semiconductors, LEDs, various devices, sensor wafers, glass substrates, etc.
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Company information
For over half a century, we have continuously refined our technological and product capabilities. By integrating Ushio's unique proposal power with these strengths, we provide solutions that pave the way for the next generation to society and the market. In the business domain of light and industry, where further evolution is anticipated, we will maximize all our capabilities to contribute to the development of our customers and society.
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