This is an introduction to the lineup of parallel light exposure devices.
As a uniform irradiation light source, it is used for various applications such as precision pattern exposure, pattern exposure of semiconductor device elements, and wafer exposure.
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The parallel light exposure device is used for various applications such as precision pattern exposure, pattern exposure of semiconductor device elements, and wafer exposure, serving as a uniform illumination light source. [Catalog Products] ● Multi-light ● Optical Modurex ● Parallel Light Exposure Device ● Double-sided Parallel Light Exposure Device *For details, please download the catalog and contact us.
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For over half a century, we have continuously refined our technological and product capabilities. By integrating Ushio's unique proposal power with these strengths, we provide solutions that pave the way for the next generation to society and the market. In the business domain of light and industry, where further evolution is anticipated, we will maximize all our capabilities to contribute to the development of our customers and society.
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