Free introductory seminars for semiconductor-related equipment analysis simulation software are being held regularly♪

For reducing man-hours and costs! Capable of various simulations such as thin film generation, sputtering, and plasma etching. Rest assured with support after implementation.

Our company offers analysis software specialized for semiconductor-related equipment. We have a lineup of rarefied fluid analysis software and plasma analysis software, which are actively used in simulations for organic EL and magnetron sputtering. This is for those who are facing challenges such as "I want to develop new products," "I want to create and verify actual equipment during product improvement," or "I want to conduct preliminary verification and comparative verification with equipment." Additionally, since these are in-house developed products, we provide extensive support even after implementation. 【Lineup / Features】 《Rarefied Fluid Analysis Software 'DSMC-Neutrals'》 ■ Supports unstructured meshes, allowing calculations for complex shapes ■ Capable of simulating gas flow throughout the entire equipment 《Plasma Analysis Software 'Particle-PLUS'》 ■ Enables low-pressure plasma simulations ■ Useful for research, development, and manufacturing of devices and materials using plasma *For more details, please refer to the materials. Feel free to contact us as well.

• Analysis and prediction system
• Scientific Calculation and Simulation Software

Analysis of gas flow under low-pressure conditions. Analysis software compatible with rarefied gases (rarefied fluids).

**Features** - By adopting an unstructured mesh, it is possible to compute the exact shape of complex real devices. - High parallel efficiency allows for quick computation results even for large-scale shapes. - Since it employs a particle method, unlike fluid models, it can achieve a converged solution even with poor-quality computational grids. - With comprehensive technical support, even those new to simulation or busy with experiments can reliably obtain results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations that include chemical reactions like CVD. **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculations of dissociation, recombination, and molecular (atomic) exchange reactions. - Multiple reaction equations can be set up on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

• Analysis and prediction system
• Scientific Calculation and Simulation Software

"Particle-PLUS" is a plasma analysis software suitable for simulations such as plasma reaction furnaces and chemical vapor deposition (CVD).

Particle-PLUS is plasma and rarefied fluid analysis software that uses the particle method. It is effective for research, development, and manufacturing of devices and materials using plasma. It is also capable of analyzing advanced physical models such as dual-frequency CCP and external circuit models. With comprehensive support, even those new to simulation or busy with experiments can reliably achieve results. The software employs a particle model to analyze plasma, utilizing the PIC/MC (Particle In Cell / Monte Carlo) method to track the motion of particles representing electrons and ions. Depending on the target plasma density, it efficiently switches between implicit methods for relatively high densities and explicit methods for low densities, allowing for effective solutions even for complex models. It excels in plasma simulations of low-pressure gases, where fluid modeling is particularly challenging. In addition to standard functions for CCP, ICP, and magnetron sputtering calculations, customization to fit customer devices is also available.

• Other analytical equipment
• Scientific Calculation and Simulation Software
• Other Software

Dilute fluid analysis software 'DSMC-Neutrals' that also supports 'shower head type CVD' analysis.

Simulation analysis of gas flow in a shower head type CVD device Initially supports various simulations 【Features】 ■ Adopts unstructured mesh, allowing for calculations that reflect the complex shapes of actual devices ■ High parallel efficiency enables quick computation results even for large-scale geometries ■ Utilizes a particle method, ensuring convergence to a solution even with poor-quality computational grids, unlike fluid models ■ Comprehensive technical support allows beginners and those busy with experiments to reliably achieve results ◆ Supports various cases ◆ - Simulation of dilute gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as chemical vapor deposition (CVD), organic light-emitting diode (OLED), and molecular beam epitaxy (MBE) ◆ Outputs various computational results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set up on the GUI *We also offer contract analysis, so please feel free to contact us.*

• Scientific Calculation and Simulation Software

For simulating gas flow and thin film formation. Short computation time even for large-scale shapes.

Our company offers analysis software specialized for semiconductor-related equipment. We have a lineup of rarefied fluid analysis software and plasma analysis software, which are effective for simulations of organic EL and magnetron sputtering. We can also accommodate customer needs. 【Product Lineup】 《Rarefied Fluid Analysis Software 'DSMC-Neutrals'》 ■ Supports unstructured meshes, allowing calculations for complex shapes ■ Capable of simulating gas flow throughout the entire device 《Plasma Analysis Software 'Particle-PLUS'》 ■ Enables low-pressure plasma simulations ■ Useful for research, development, and manufacturing of devices and materials using plasma With these two systems, we can support various simulations in semiconductor manufacturing, including thin film generation, sputtering, and plasma etching. *For more details, please refer to the materials. Feel free to contact us with any inquiries.

• Analysis and prediction system
• Scientific Calculation and Simulation Software

Fujikohsuhou Industrial Co., Ltd. will hold an online seminar titled "Tips for Setting Laser Hardening Conditions" on July 20, 2025 (Wednesday). In laser hardening, factors such as output and speed are related to the quality of hardening. We will explain how output and speed are connected to quality factors. This seminar is aimed at those who are looking to start utilizing laser hardening. 【Recommended for】 ■ Those who want to learn about methods for setting laser hardening conditions ■ Those who want to obtain technical information about laser hardening

Take the 'first step' in DX talent development in Fukuoka. We will hold a free seminar where you can learn reskilling strategies that can be applied in the field through case studies and experiences! 'I've become responsible for DX, but I don't know where to start.' This is a participatory seminar aimed at representatives from small and medium-sized enterprises in Fukuoka City, Fukuoka Prefecture, where you can learn the 'first steps' in DX talent development and implementation support. While introducing case studies of representative DX tools such as Power Automate and Power BI, you will experience hands-on sessions with Copilot, allowing you to grasp practical small-start methods that can be implemented on-site. The content also includes specific success stories from the Fukuoka region, along with tips for promoting understanding and advancement within your organization.

We will be exhibiting at INCHEM TOKYO 2025, which will be held at Tokyo Big Sight from September 17 (Wednesday) to September 19 (Friday). This time, we will host many events, including special project stages and mini-seminars. At our booth, we will introduce our solutions and technologies based on the theme of "Sustainable Plant Engineering" from three different concepts. Please be sure to stop by our booth, East Hall 6, K-17.

The Siemens EDA Tech Forum is a technical event aimed at sharing the latest technological trends, case studies, and solutions to challenges with everyone involved in the design and development of silicon systems and electronic systems, while addressing evolving technologies, the densification and complexity of designs, and various design challenges, all while meeting requirements for quality, safety, and reliability. The goal is to deepen insights and networks towards achieving sustainable business. The forum covers a wide range of topics, from advanced design technologies and methods in fields such as 3D ICs, chiplets, chips for AI and ML (machine learning), and IC packaging, to the design, analysis, and collaborative development of electronic systems, including printed circuit boards, across multiple domains, as well as building ecosystems both internally and externally using digital threads. Through case presentations and explanations of design methods by industry leaders, it supports solutions to challenges faced in daily design work from all directions. This is a free technical event that requires pre-registration. We hope you will participate!

The TOPPAN Group, consisting of TOPPAN Edge Inc., TOPPAN Digital Inc., and AiOi System Co., Ltd., will hold a co-hosted webinar aimed at solving challenges in the logistics field on August 20, 2025 (Wednesday). In this webinar, we will introduce a wealth of immediately useful information, including key points of the Comprehensive Logistics Efficiency Act, practical approaches to logistics DX through data utilization, and examples of improvements using subsidies. ▼ Recommended for: - Personnel facing challenges in logistics data analysis for business improvement - Logistics companies aiming to optimize warehouse operations and improve productivity - Companies interested in learning about logistics improvement cases utilizing subsidies - Companies considering the use of RFID in logistics operations ▼ Event Overview Date and Time: August 20, 2025 (Wednesday) 14:00–15:00 Format: Online (pre-registration required) Participation Fee: Free Co-hosted by: TOPPAN Edge / TOPPAN Digital / AiOi System We hope this seminar will serve as an opportunity to consider "what to start with and how to proceed" regarding the challenges faced by the logistics industry. We sincerely look forward to your participation.