Free introductory seminars for semiconductor-related equipment analysis simulation software are being held regularly♪

For reducing man-hours and costs! Capable of various simulations such as thin film generation, sputtering, and plasma etching. Rest assured with support after implementation.

Our company offers analysis software specialized for semiconductor-related equipment. We have a lineup of rarefied fluid analysis software and plasma analysis software, which are actively used in simulations for organic EL and magnetron sputtering. This is for those who are facing challenges such as "I want to develop new products," "I want to create and verify actual equipment during product improvement," or "I want to conduct preliminary verification and comparative verification with equipment." Additionally, since these are in-house developed products, we provide extensive support even after implementation. 【Lineup / Features】 《Rarefied Fluid Analysis Software 'DSMC-Neutrals'》 ■ Supports unstructured meshes, allowing calculations for complex shapes ■ Capable of simulating gas flow throughout the entire equipment 《Plasma Analysis Software 'Particle-PLUS'》 ■ Enables low-pressure plasma simulations ■ Useful for research, development, and manufacturing of devices and materials using plasma *For more details, please refer to the materials. Feel free to contact us as well.

• Analysis and prediction system
• Scientific Calculation and Simulation Software

Analysis of gas flow under low-pressure conditions. Analysis software compatible with rarefied gases (rarefied fluids).

**Features** - By adopting an unstructured mesh, it is possible to compute the exact shape of complex real devices. - High parallel efficiency allows for quick computation results even for large-scale shapes. - Since it employs a particle method, unlike fluid models, it can achieve a converged solution even with poor-quality computational grids. - With comprehensive technical support, even those new to simulation or busy with experiments can reliably obtain results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations that include chemical reactions like CVD. **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculations of dissociation, recombination, and molecular (atomic) exchange reactions. - Multiple reaction equations can be set up on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

• Analysis and prediction system
• Scientific Calculation and Simulation Software

"Particle-PLUS" is a plasma analysis software suitable for simulations such as plasma reaction furnaces and chemical vapor deposition (CVD).

Particle-PLUS is plasma and rarefied fluid analysis software that uses the particle method. It is effective for research, development, and manufacturing of devices and materials using plasma. It is also capable of analyzing advanced physical models such as dual-frequency CCP and external circuit models. With comprehensive support, even those new to simulation or busy with experiments can reliably achieve results. The software employs a particle model to analyze plasma, utilizing the PIC/MC (Particle In Cell / Monte Carlo) method to track the motion of particles representing electrons and ions. Depending on the target plasma density, it efficiently switches between implicit methods for relatively high densities and explicit methods for low densities, allowing for effective solutions even for complex models. It excels in plasma simulations of low-pressure gases, where fluid modeling is particularly challenging. In addition to standard functions for CCP, ICP, and magnetron sputtering calculations, customization to fit customer devices is also available.

• Other analytical equipment
• Scientific Calculation and Simulation Software
• Other Software

Dilute fluid analysis software 'DSMC-Neutrals' that also supports 'shower head type CVD' analysis.

Simulation analysis of gas flow in a shower head type CVD device Initially supports various simulations 【Features】 ■ Adopts unstructured mesh, allowing for calculations that reflect the complex shapes of actual devices ■ High parallel efficiency enables quick computation results even for large-scale geometries ■ Utilizes a particle method, ensuring convergence to a solution even with poor-quality computational grids, unlike fluid models ■ Comprehensive technical support allows beginners and those busy with experiments to reliably achieve results ◆ Supports various cases ◆ - Simulation of dilute gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as chemical vapor deposition (CVD), organic light-emitting diode (OLED), and molecular beam epitaxy (MBE) ◆ Outputs various computational results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set up on the GUI *We also offer contract analysis, so please feel free to contact us.*

• Scientific Calculation and Simulation Software

For simulating gas flow and thin film formation. Short computation time even for large-scale shapes.

Our company offers analysis software specialized for semiconductor-related equipment. We have a lineup of rarefied fluid analysis software and plasma analysis software, which are effective for simulations of organic EL and magnetron sputtering. We can also accommodate customer needs. 【Product Lineup】 《Rarefied Fluid Analysis Software 'DSMC-Neutrals'》 ■ Supports unstructured meshes, allowing calculations for complex shapes ■ Capable of simulating gas flow throughout the entire device 《Plasma Analysis Software 'Particle-PLUS'》 ■ Enables low-pressure plasma simulations ■ Useful for research, development, and manufacturing of devices and materials using plasma With these two systems, we can support various simulations in semiconductor manufacturing, including thin film generation, sputtering, and plasma etching. *For more details, please refer to the materials. Feel free to contact us with any inquiries.

• Analysis and prediction system
• Scientific Calculation and Simulation Software

We are pleased to announce the archive distribution of our seminar titled "New Plan 'Mojitori Plus' Debuts! From Paper to Data! The First Step Towards In-House DX with Mojitori." 'Mojitori' allows you to convert text from photos, images, PDF files, and more into data, automatically inputting it into various fields in kintone. In this seminar, we will clearly explain the basic functions and usage of Mojitori. Additionally, we will provide detailed explanations about the Plus plan and the document-focused Mojitori, which were added in the major update in November. 【Recommended for】 - Those who are struggling with frequent transcription errors due to manual data entry. - Those who wish to digitize items currently stored on paper. 【Timetable】 - Overview of Mojitori's functions - Overview of Mojitori Plus's functions - Details and pricing of each plan - Q&A session We look forward to your registration.

Is the performance report you are currently creating, which takes a tremendous amount of time and effort, appreciated by the management? Are you facing complaints from management such as: - The reports are coming out late (results from the previous month are reported around the 20th of the current month) - The reports are difficult to understand and hard to read - There is missing necessary information In this seminar, we will introduce a new system for managing performance information that addresses these issues, along with specific methods. The cost is free. We encourage you to participate. □ Seminar Content 1. What is performance improvement? 2. What information is useful for performance improvement? 3. How to view performance information 4. A system for automatically generating performance information and accessing necessary information when needed (Using our company's developed performance information management tool as a model)

Holding a management strategy seminar to "embed" generative AI and connect it to organizational outcomes! Are you facing challenges such as "not knowing how to use it," "lack of progress in utilization," or "not being embedded due to organizational rules and management" while advancing AI implementation? In this seminar, we will thoroughly explain the secrets to realizing an organization where AI operates autonomously, drawing from the generative AI training of Panhouse Co., Ltd. and the management methods of Shikigaku Co., Ltd. In particular, we will share specific case studies of the "Agent Model AI," which is gaining attention as a next-generation AI application, along with organizational design know-how for integrating generative AI into business, management pitfalls that hinder embedding, and their solutions, all accompanied by concrete examples. What you can learn in this seminar: - Experiences and case studies of Agent Model AI (exabase generative AI demo) - Initial preparations and design know-how to accelerate AI utilization - Key management points to break down organizational barriers that hinder AI embedding If you are in management or responsible for ensuring that generative AI becomes a "truly usable" system rather than just "trying it out," we encourage you to participate in this opportunity.

We are pleased to announce that Pan House Co., Ltd. will be participating in the online marketing conference "Data Driven Marketing 2026," which will be held from January 14 (Wednesday) to 16 (Friday), 2026. At this event, where professionals achieving results at the forefront will gather, our Chief Integration Officer, Tsubasa Kimura, will explain the new organizational approaches utilizing AI. Organizational Theory for "Maximum Effect with Minimal Effort" in the AI Era As AI technology rapidly evolves and the marketing environment changes significantly due to cookie regulations, relying on "past success experiences" and "intuition and experience" is reaching its limits. In this session, we will focus on how to utilize AI not just as a tool, but as a strategic infrastructure to build competitive advantages for organizations. We will discuss specific examples and methods on how to maximize the efficiency of marketing operations and establish an organizational structure that leads to results with minimal effort.

What makes employee benefits truly drive action on the frontline? https://prtimes.jp/main/html/rd/p/000000077.000076589.html This free online webinar, also featured on PR TIMES, explores how well-designed employee benefits can lead to behavioral change and long-term adoption, based on real company case studies. ◆ Improved employee retention ◆ Reduced absenteeism and early leave ◆ Key approaches that contributed to higher productivity While the case studies focus mainly on logistics companies, the session is relevant across industries for those interested in workplace improvement and employee retention.