日本機能材料 Company Profile

We contribute to the development of society and the innovation of people's lifestyles through the discovery of advanced functional materials and their rapid dissemination.

Japan Functional Materials will focus on advanced "Group 4" epitaxial growth services as its top priority business. Specifically, this includes epitaxial growth of Si, SiGe, SiGeC, Ge, SOI (Silicon on Insulator), SOS (Silicon on Sapphire), and others. We will also form multilayer films doped with Group 3/5 elements (such as boron and phosphorus). We accept requests for embedded epitaxial growth into trenches as well. Selective growth will also be performed. The thickness of each layer is generally on the order of nanometers. Production will be carried out by the Lawrence Semiconductor Research Laboratory (LSRL) in the United States. We will receive individual specifications, consolidate them for production, and Japan Functional Materials will serve as an appropriate bridge between customers and manufacturers. Manufacturers capable of receiving orders and producing such epitaxial layers are rare worldwide. Please consult with us first. Upon request, we will visit and provide explanations. We are also involved in various other businesses, so please take a look at our company profile.