Introduction to High Aspect Ratio Resist Processing Technology
Aspect ratio 1:5 processing results! Can be used in a wide range of fields!
Our company is capable of processing using "high aspect ratio resist" with a high aspect ratio between pattern line width and film thickness (height). We have a proven track record of processing with an aspect ratio of 1:5. With this technology, the resist pattern becomes not just a protective film but a fine three-dimensional structure, expanding its range of applications. 【Features】 ■ Proven track record of processing with an aspect ratio of 1:5 ■ Wide range of applications *For more details, please refer to the catalog or feel free to contact us.
- Company：フォトプレシジョン
- Price：Other
