Automatic exposure device
A mask aligner that achieves a high throughput of 190 WPH.
This is a fully automatic exposure device compatible with a 2-inch wafer size. By replacing the conventional multi-joint robots used in wafer transport with three self-developed transport robots, we have achieved a high throughput of processing 190 pieces (2-inch wafers) per hour. In particular, the newly developed alignment image processing employs auto-alignment with a combination of arbitrary coordinate specified search and intelligent θ search. Additionally, to ensure stable visibility, the microscope's halogen lighting features a new mechanism that also feeds back on illumination attenuation through image processing. The operator simply sets the photomask and wafer and selects a pre-stored exposure recipe, allowing for automatic execution of wafer transport, alignment with the photomask, and exposure, enabling stable precision exposure that does not depend on the operator or their experience.
- Company：ウシオライティング
- Price：Other
