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How to choose cerium oxide polishing materials (abrasives)

How to choose cerium oxide polishing materials (abrasives)

Introducing how to choose from various types of cerium oxide polishing compounds!

There are various types of cerium oxide abrasives. Please choose according to your application. 【How to choose】 ■ Choose based on "average particle shape" ■ Choose based on "grinding rate" ■ Choose based on "specific surface area" ■ Choose based on "main applications and features" ■ Choose based on "form" *You can view detailed information in the related links. For more information, please feel free to contact us.

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Cerium Oxide Polishing Material for Glass 'MIREK'

Cerium Oxide Polishing Material for Glass 'MIREK'

The lineup includes the slurry-type E series and the dry powder HL series!

"MIREK" is a glass polishing material that can be used for LCD TVs, optical glass, single-lens reflex cameras, and more. "E020CS" can be used for finishing, with a composition of LaCePr, TREO at 94.5%, and CeO2/TREO at 62.4%. Please feel free to contact us when you need assistance. 【Specifications (Excerpt)】 ■HL05 - Composition: LaCe - TREO: 96.7% - CeO2/TREO: 67.1% - F: 4.5% - Grain diameter: 0.51μm *For more details, please refer to the PDF document or feel free to contact us.

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Introduction of the polishing material (abrasive) for cerium oxide glass, "MIREK".

Introduction of the polishing material (abrasive) for cerium oxide glass, "MIREK".

To a higher level of polishing precision!

It has been about half a century since our company, Yachiyo Micro Science, began selling cerium oxide polishing materials "MIREK" manufactured by Mitsui Mining & Smelting Co., Ltd. During this long period, the needs have changed, starting from polishing agents for construction glass, moving through eyeglass lenses, camera lenses, LCD glass, hard disk substrates, and now being used in cutting-edge fields such as EUV photomask blanks and optical filters. The main features of our product are its stability in quality and high classification accuracy. We invite you to evaluate it at least once. [Features] ■ Stability in quality ■ High classification accuracy *For more details, please feel free to contact us.

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Abrasive Material (Agent) Mirek HL Series (2 Element Product) Dry Powder Type

Abrasive Material (Agent) Mirek HL Series (2 Element Product) Dry Powder Type

The average particle size is approximately 0.5 to 1.5 μm! The classification accuracy is high, and the product has stable quality.

We would like to introduce the "Mirek HL Series (2-element product) Dry Powder Type" that we handle. This product has been improved to a cerium and lanthanum-based 2-element product, excluding praseodymium, which allows for stable procurement and supply with minimal impact from price fluctuations. Additionally, we offer a variety of additives, making it possible to meet many precision requirements (such as improvements in normality, dispersibility, and re-dispersibility). 【Features】 ■ Stable procurement and supply ■ Average particle size is approximately 0.5 to 1.5 μm ■ High classification accuracy and stable quality ■ A variety of additives are available *For more details, please feel free to contact us.

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Abrasive Material (Agent) Milake HL Series (2-element Product) Slurry Type

Abrasive Material (Agent) Milake HL Series (2-element Product) Slurry Type

Optical glass, quartz glass, and even crystal! For applications that require high-quality surface precision.

We would like to introduce the "Mirek HL Series (2-element product) Slurry Type" that we handle. Currently, there is an increasing number of applications requiring high-quality surface precision, ranging from optical glass, quartz glass, filter glass, to crystals. This polishing material is suitable for those who are seeking a quality level beyond the current standards (improvement in surface precision Ra, reduction in defects, etc.) or for those who are experiencing compatibility issues with polishing pads (such as poor chemical resistance or short pad life) and wish to improve these aspects. 【Recommended for】 ■ Those who are seeking a quality level beyond the current standards (improvement in surface precision Ra, reduction in defects, etc.) ■ Those who are struggling with drying adhesion when using colloidal silica ■ Those who wish to improve compatibility issues with polishing pads (such as poor chemical resistance or short pad life) *For more details, please feel free to contact us.

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Cerium Oxide Abrasive (Polishing Material) Glass Polishing Material 'MIREK'

Cerium Oxide Abrasive (Polishing Material) Glass Polishing Material 'MIREK'

Absolute confidence in quality! From optical lenses to EUV mask blanks.

Everyone viewing this page is likely involved in fields such as optical lenses and optical electronic materials. I believe you are seeking to reduce scratches and achieve a smoother and faster finish more than ever before. We have absolute confidence in the quality of our product, 'MIREK.' In particular, we pay special attention to the unevenness of particle size, which can worsen scratches and surface irregularities. If you have any concerns regarding the adhesion of abrasives to glass or polishing machines, please feel free to consult us. 【Features】 ■ We pay special attention to the unevenness of particle size, which can worsen scratches and surface irregularities. ■ Compatible with everything from optical lenses to EUV mask blanks. *For more details, please refer to the related links or feel free to contact us.

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Specialized trading company for grinding and polishing tools and auxiliary materials - Yachiyo Micro Science Co., Ltd.

Specialized trading company for grinding and polishing tools and auxiliary materials - Yachiyo Micro Science Co., Ltd.

For inquiries about grinding and polishing, contact Yachiyo Micro Science, which operates grindingpolishing.com!

Yachiyo Micro Science was founded in 1937 and has been handling polishing auxiliary materials for optical glass for about 50 years. Throughout this long history, we have developed and provided various products tailored to our customers' needs, allowing us to propose optimal conditions for them. Our products are widely used, including in cutting-edge applications such as semiconductor compounds and EUV mask blanks. **Main Products** - Cerium oxide polishing agent (MIREK) - Polishing pads (urethane / hard urethane / suede, etc.) - Pad dressers (features: ultra-lightweight / high precision / reduced dressing time) - Diamond pellets - Fixed abrasive tools, Briermeur (diamond tools for double-sided / single-sided lapping machines) - Coolant, Diamond Cut series (cutting fluid) - Coagulants (wastewater treatment agents) **Operational Information Sites** GrindingPolishing.com (grinding and polishing technology information site) Coagulants.com (water treatment information site) We are constantly striving for technological innovation and quality improvement to meet our customers' diverse needs. If you have any issues in your processing operations, please feel free to consult us. We will provide optimal solutions utilizing our specialized knowledge and extensive experience.

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