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We spoke with Aizu University, Tokyo Institute of Technology, and Kioxia Corporation, who are engaged in research on mask optimization, one of the semiconductor process technologies. Previously, Aizu University, Tokyo Institute of Technology, and Kioxia had been developing algorithms for mask optimization using mathematical optimization techniques and publishing papers. This time, they utilized quantum annealing and an Ising machine (hereinafter referred to as "Ising machine") and published the results of their joint research as a paper. We discussed the background of utilizing the Ising machine and the significance of this research. *For more detailed information, please refer to the related links. For further details, you can download the PDF or feel free to contact us.*
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