Dilute fluid analysis software 'DSMC-Neutrals' that also supports 'shower head type CVD' analysis.
Simulation Analysis of Gas Flow in Showerhead-Type CVD Equipment Initially compatible with various simulations 【Features】 ■ By adopting a non-structured mesh, it is possible to calculate the complex shapes of actual devices as they are. ■ High parallel efficiency allows for quick computation results even for large-scale shapes. ■ Since a particle method is used, unlike fluid models, convergence solutions can always be obtained even with poor-quality computational grids. ■ With comprehensive technical support, even those new to simulations or busy with experiments can reliably achieve results. ◆ Supports various cases ◆ - Simulation of rarefied gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as Chemical Vapor Deposition (CVD), Organic Light Emitting Diodes (OLED), and Molecular Beam Epitaxy (MBE) ◆ Outputs various computational results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set on the GUI *We also offer contract analysis, so please feel free to contact us.*
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**Features** - A simulation software for dilute fluid using particle methods, useful for experiments and equipment development involving vacuum chambers. - Capable of simulating film formation that includes chemical reactions such as CVD. - Adopts unstructured meshes, allowing calculations to be performed directly on the actual shape of the equipment. - High parallel efficiency enables quick computation results even for large-scale shapes. - Unlike fluid models, the use of particle methods ensures convergence to a solution even with poor quality computational grids. - Comprehensive technical support ensures that even those new to simulation or busy with experiments can reliably achieve results. - For other features and details, please contact us.
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◆ Organic EL (OLED) Simulation * Uniformity of film deposition rate, optimization of shape, temperature dependence of organic material deposition distribution in organic EL simulation, etc. ◆ Molecular Beam Epitaxy (MBE) Simulation * Optimization of molecular beam cell shape, uniformity of deposition distribution, concentration distribution in molecular beam epitaxy simulation, etc. ◆ Showerhead-type CVD (Chemical Vapor Deposition) * Evaluation of deposition rate * Evaluation of film uniformity * Distribution of radicals affecting film growth in the gas phase * Concentration distribution on the substrate surface * Evaluation of gas flow rate and flow volume entering the chamber from the showerhead section ◆ Vacuum Pump Exhaust Simulation * Temperature and cross-sectional area dependence of conductance, effects of gas pockets and outgassing, etc. ◆ Behavior of Macroparticles (Dust) * Effects of macroparticles in the chamber, etc. ◆ Hypersonic Rarefied Flow * Density and temperature distribution around objects, effects of chemical reactions, etc. ◆ Shock Waves ◆ Benard Convection ◆ Behavior of Dust in the Chamber * Effects of dust on the film that need to consider gravity.
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