Semiconductor Solutions Proposal

Introduction to dew point meters, oxygen concentration meters, temperature and humidity meters, and anemometers for semiconductor manufacturing and clean rooms.

In the semiconductor manufacturing process, the removal of moisture and oxygen is a significant challenge. Our dew point meters, temperature and humidity meters, and oxygen concentration meters are used in various processes such as semiconductor manufacturing, transportation, and inspection. They are also used for measuring the dehumidification in dry air and the gas purity of nitrogen gas, argon gas, helium gas, and hydrogen gas. For moisture measurement, we primarily use the TK-100 capacitive dew point meter (alumina type), which can measure down to a minimum dew point of -100°C, the TE-660 dew point meter (polymer type) for a minimum dew point of -60°C, and the MBW mirror-cooled (mirror type) dew point meter, which can measure from -95°C to +99°C and is used when high precision is required or as a reference instrument for dew point meters. In the humidity domain, the simple EE060 and the EE33 temperature and humidity meter, which is equipped with measures to prevent condensation in high temperature and high humidity environments, are mainly used. For oxygen concentration measurement, during oxygen removal by hydrogen substitution, the 2001LC galvanic cell oxygen concentration meter is used for PPM levels, while in situations without hydrogen, the Model 4100 zirconia oxygen concentration meter is used for analysis down to PPB levels, among various scenarios. Additionally, an anemometer is also utilized for measuring micro-wind in clean rooms and manufacturing equipment.

Other measuring instruments