Free introductory seminars for semiconductor-related equipment analysis simulation software are being held regularly♪

For reducing man-hours and costs! Capable of various simulations such as thin film generation, sputtering, and plasma etching. Rest assured with support after implementation.

Our company offers analysis software specialized for semiconductor-related equipment. We have a lineup of rarefied fluid analysis software and plasma analysis software, which are actively used in simulations for organic EL and magnetron sputtering. This is for those who are facing challenges such as "I want to develop new products," "I want to create and verify actual equipment during product improvement," or "I want to conduct preliminary verification and comparative verification with equipment." Additionally, since these are in-house developed products, we provide extensive support even after implementation. 【Lineup / Features】 《Rarefied Fluid Analysis Software 'DSMC-Neutrals'》 ■ Supports unstructured meshes, allowing calculations for complex shapes ■ Capable of simulating gas flow throughout the entire equipment 《Plasma Analysis Software 'Particle-PLUS'》 ■ Enables low-pressure plasma simulations ■ Useful for research, development, and manufacturing of devices and materials using plasma *For more details, please refer to the materials. Feel free to contact us as well.

• Analysis and prediction system
• Scientific Calculation and Simulation Software

Analysis of gas flow under low-pressure conditions. Analysis software compatible with rarefied gases (rarefied fluids).

**Features** - By adopting an unstructured mesh, it is possible to compute the exact shape of complex real devices. - High parallel efficiency allows for quick computation results even for large-scale shapes. - Since it employs a particle method, unlike fluid models, it can achieve a converged solution even with poor-quality computational grids. - With comprehensive technical support, even those new to simulation or busy with experiments can reliably obtain results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations that include chemical reactions like CVD. **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculations of dissociation, recombination, and molecular (atomic) exchange reactions. - Multiple reaction equations can be set up on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

• Analysis and prediction system
• Scientific Calculation and Simulation Software

"Particle-PLUS" is a plasma analysis software suitable for simulations such as plasma reaction furnaces and chemical vapor deposition (CVD).

Particle-PLUS is plasma and rarefied fluid analysis software that uses the particle method. It is effective for research, development, and manufacturing of devices and materials using plasma. It is also capable of analyzing advanced physical models such as dual-frequency CCP and external circuit models. With comprehensive support, even those new to simulation or busy with experiments can reliably achieve results. The software employs a particle model to analyze plasma, utilizing the PIC/MC (Particle In Cell / Monte Carlo) method to track the motion of particles representing electrons and ions. Depending on the target plasma density, it efficiently switches between implicit methods for relatively high densities and explicit methods for low densities, allowing for effective solutions even for complex models. It excels in plasma simulations of low-pressure gases, where fluid modeling is particularly challenging. In addition to standard functions for CCP, ICP, and magnetron sputtering calculations, customization to fit customer devices is also available.

• Other analytical equipment
• Scientific Calculation and Simulation Software
• Other Software

Dilute fluid analysis software 'DSMC-Neutrals' that also supports 'shower head type CVD' analysis.

Simulation analysis of gas flow in a shower head type CVD device Initially supports various simulations 【Features】 ■ Adopts unstructured mesh, allowing for calculations that reflect the complex shapes of actual devices ■ High parallel efficiency enables quick computation results even for large-scale geometries ■ Utilizes a particle method, ensuring convergence to a solution even with poor-quality computational grids, unlike fluid models ■ Comprehensive technical support allows beginners and those busy with experiments to reliably achieve results ◆ Supports various cases ◆ - Simulation of dilute gas flow in a vacuum chamber - Simulation of thin film generation in semiconductor manufacturing - Simulation of thin film generation in semiconductor manufacturing such as chemical vapor deposition (CVD), organic light-emitting diode (OLED), and molecular beam epitaxy (MBE) ◆ Outputs various computational results ◆ - Calculation of chemical reactions - Calculation of chemical reactions from Arrhenius-type reaction data - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions - Multiple reaction equations can be set up on the GUI *We also offer contract analysis, so please feel free to contact us.*

• Scientific Calculation and Simulation Software

For simulating gas flow and thin film formation. Short computation time even for large-scale shapes.

Our company offers analysis software specialized for semiconductor-related equipment. We have a lineup of rarefied fluid analysis software and plasma analysis software, which are effective for simulations of organic EL and magnetron sputtering. We can also accommodate customer needs. 【Product Lineup】 《Rarefied Fluid Analysis Software 'DSMC-Neutrals'》 ■ Supports unstructured meshes, allowing calculations for complex shapes ■ Capable of simulating gas flow throughout the entire device 《Plasma Analysis Software 'Particle-PLUS'》 ■ Enables low-pressure plasma simulations ■ Useful for research, development, and manufacturing of devices and materials using plasma With these two systems, we can support various simulations in semiconductor manufacturing, including thin film generation, sputtering, and plasma etching. *For more details, please refer to the materials. Feel free to contact us with any inquiries.

• Analysis and prediction system
• Scientific Calculation and Simulation Software

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■ Back Office DXPO Tokyo 2026 Autumn Exhibition Participation Information Date: November 17 (Tuesday) - November 18 (Wednesday), 2026 Time: November 17 (Tuesday) 09:30 - 17:30 / November 18 (Wednesday) 09:30 - 16:30 Venue: Ariake GYM-EX *New exhibition hall located 2 stations from Tokyo Big Sight Station, approximately a 5-minute walk from Ariake Tennis Forest Station Access: 1-10-1 Ariake, Koto-ku, Tokyo (5-minute walk from "Ariake Tennis Forest Station" on the Yurikamome Line / 17-minute walk from "Kokusai Tenjijo Station" on the Rinkai Line) Booth Number: "Recruitment and Training Solutions Exhibition" For more details, please check the QR code or URL here. *This will redirect you to an external link. Advance reservations are recommended! If you would like to "carefully listen to discussions" or "efficiently receive information at the venue on the day," please check the exhibition details and use the visit reservation on the official Back Office DXPO website! *On the day, you can consult with the staff smoothly without waiting! Additionally, if you register in advance for your visit this time, the usual entrance fee of 5,000 yen will be waived! We highly recommend it when you come★

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This session is aimed at engineers primarily in the manufacturing industry, focusing on data utilization, and will explain practical approaches to factor exploration and predictive model building using JMP products. Analysis does not yield optimal results in a single attempt; it is crucial to enhance accuracy through repeated trial and error in data preparation and model building. In particular, the quality of data preparation, such as preprocessing and feature creation, significantly influences the results, and JMP allows for efficient progress while visualizing the process. Using publicly available data for model building, we will introduce a series of processes from preparation, including visualization, preprocessing, and feature creation, to factor exploration through correlation and regression analysis, predictive model building (such as neural networks and random forests), and extraction of important factors, all through trial and error. Program: 1) What to do before the model: Key points of data preparation and trial and error using JMP 2) How to proceed with factor exploration and predictive model building without making it a black box ▼Details & Registration https://www.jmp.com/ja/events/live-webinars/non-series/2026/12-15-factor-exploration

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