The keyword "the difference between etching and liftoff" has been added to the technology trend keywords.

Etching and lift-off are both processes related to photolithography, but they differ in their purposes and processing methods. Here, I will explain each process and their differences.
Etching
Etching is a process that uses patterned resist created by photolithography as a mask to remove material according to that pattern. By removing unwanted parts, it forms circuits or structures on the substrate surface.
1) Main purpose: To remove unwanted material and engrave a pattern on the surface.
2) Method:
Dry etching (such as reactive ion etching): Uses gases that involve chemical reactions to remove material from the substrate surface. It allows for very precise processing.

Inquiry about this news
Contact Us OnlineMore Details & Registration
Details & Registration
Related Links
Etching and liftoff are both processes related to photolithography, but they differ in purpose and processing methods. This article explains each process and their differences. Etching is a process that uses patterned resist from photolithography as a mask to remove material according to that pattern.