Analysis Software(3d) - List of Manufacturers, Suppliers, Companies and Products | IPROS

Last Updated： Aggregation Period:Aug 05, 2026～Sep 01, 2026
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Analysis Software Product List

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[Example] Particle-PLUS AC Magnetron Sputtering

[Example] Particle-PLUS AC Magnetron Sputtering

Introduction of analysis examples using "Particle-PLUS": "AC Magnetron Sputtering Simulation"

"Particle-PLUS" is a simulation software suitable for research, development, and manufacturing of devices and materials using plasma. - It specializes in low-pressure plasma analysis. - By combining axisymmetric models with mirror-symmetric boundary conditions, it can quickly obtain results without the need to simulate the entire device. - It excels in plasma simulations for low-pressure gases, where calculations using fluid models are challenging. - It supports 2D (two-dimensional) and 3D (three-dimensional) analyses, allowing efficient analysis even for complex models. - As a strength of our in-house developed software, customization to fit the customer's device is also possible. ◆ Supports various applications ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD) - Electrophoresis, etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us.

  • Scientific Calculation and Simulation Software
  • Other Software
  • Other analytical equipment
  • Analysis Software

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【AI Inspection】Providing a smooth operation and analysis environment.

【AI Inspection】Providing a smooth operation and analysis environment.

Abnormality information can be output immediately in Excel or PDF format, greatly improving the efficiency of report creation tasks!

"Optim AI Inspection for Infra" provides an environment where you can view and analyze orthophotos and 3D models created from vast amounts of captured data without stress, using just a single business PC via a web browser. To assess the risk of fallen dead trees, we can instantly report the potential damage if the target dead tree were to fall, analyzing factors such as the terrain and height of the dead tree, as well as the distance to the relevant facilities. For high-risk dead trees, we offer an environment where reports can be generated and shared internally immediately. [Features] ■ Automatic orthophoto generation and AI analysis of captured images ■ Comprehensive evaluation support for deformation risks ■ Provision of a smooth operation and analysis environment *For more details, please download the PDF or feel free to contact us.

  • IT Control and Services
  • Analysis and prediction system
  • Analysis Software

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Particle Method 3D Rarefied Fluid Analysis Software 'DSMC-Neutrals'

Particle Method 3D Rarefied Fluid Analysis Software 'DSMC-Neutrals'

Analysis of gas flow under low pressure conditions. Analysis software compatible with rarefied gases (rarefied fluids).

**Features** - By adopting an unstructured mesh, it is possible to compute the exact shape of complex real devices. - High parallel efficiency allows for quick computation results even for large-scale shapes. - Since it employs a particle method, unlike fluid models, it can obtain a converged solution even with poor quality computational grids. - With comprehensive technical support, even those new to simulation or busy with experiments can reliably achieve results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations involving chemical reactions like CVD. **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Multiple reaction equations can be set up on the GUI. *For more details, please refer to the catalog or feel free to contact us.*

  • Scientific Calculation and Simulation Software
  • Analysis and prediction system
  • Analysis Software

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Semiconductor plasma analysis software 'Particle-PLUS'

Semiconductor plasma analysis software 'Particle-PLUS'

"Particle-PLUS" is a plasma and rarefied fluid analysis software that excels in ICP and CCP analysis using particle methods.

"Particle-PLUS" is software suitable for research and development of devices using plasma, compatible with ICP and CCP. - Excels in simulations of low-pressure gases where fluid modeling is challenging. - Calculation functions for inductive heating for ICP simulations. - Advanced physical model analysis such as CCP and external circuit models. - Capable of simultaneously simulating ICP and CCP. - Supports 2D and 3D, efficiently analyzing even complex models. - As a strength of our in-house developed software, customization to fit customer devices is possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us at sales@wavefront.co.jp.

  • Scientific Calculation and Simulation Software
  • Other Software
  • Other analytical equipment
  • Analysis Software

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Utilization of Experimental Design with JMP, a Statistical Analysis Software for the Chemical Industry

Utilization of Experimental Design with JMP, a Statistical Analysis Software for the Chemical Industry

Let's efficiently discover hidden optimal conditions, experimental conditions, and formulation conditions within a limited number of experiments!

In the chemical industry’s research and development, there are complex challenges where many factors, such as the optimization of formulation ratios and the examination of process conditions, affect properties. Additionally, due to constraints on raw material costs and evaluation labor, there is a demand to efficiently gain insights with a limited number of experiments. In this seminar, we will introduce practical applications of Design of Experiments (DOE) using JMP. In the first half, we will explain how to create and optimize experimental designs considering formulation factors and constraints. In the second half, we will present Deterministic Screening Designs (DSD) that can efficiently identify important factors with fewer experiments. 14:00 - 14:45 Practical Application of Experimental Design in the Chemical Industry - Experimental Design Considering Constraints and Formulations 14:45 - 15:30 Connecting Screening and Optimization - Practical Use of Deterministic Screening Designs

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