Particle Method 3D Rarefied Fluid Analysis Software 'DSMC-Neutrals'
Analysis of gas flow under low pressure conditions. Analysis software compatible with rarefied gases (rarefied fluids).
**Features** - By adopting an unstructured mesh, it is possible to compute the exact shape of complex real devices. - High parallel efficiency allows for quick computation results even for large-scale shapes. - Since it employs a particle method, unlike fluid models, it can obtain a converged solution even with poor quality computational grids. - With comprehensive technical support, even those new to simulation or busy with experiments can reliably achieve results. **Supports Various Cases** - Simulation of rarefied gas flow in a vacuum chamber. - Simulation of thin film generation in semiconductor manufacturing. - Chemical vapor deposition (CVD), organic light-emitting diode (OLED), molecular beam epitaxy (MBE). - Film deposition simulations involving chemical reactions like CVD. **Outputs Various Calculation Results** - Calculation of chemical reactions. - Calculation of chemical reactions from Arrhenius-type reaction data. - Calculation of dissociation, recombination, and molecular (atomic) exchange reactions. - Multiple reaction equations can be set up on the GUI. *For more details, please refer to the catalog or feel free to contact us.*
- Company：ウェーブフロント 本社
- Price：Other
