NK Optimizer (Photo-curable resin for nanoimprint)
Light-curable resin for nanoimprinting
NK Optimizer Series This is a photo-curable resin for nanoimprinting that applies the technology cultivated in the development and design of resist materials and optical materials. It is a photo-curable resin for nanoimprinting that can be used in sensing devices such as micro-lens arrays (MLA), diffractive optical elements (DOE), facial recognition devices, and mechless LiDAR, as well as AR/VR glasses. The "NL-S Series" offers high heat resistance and solder reflow grade. It provides materials that can be imprinted from low refractive index (nD1.35) to high refractive index (nD1.93). The "NL-N Series" is a refractive index adjustment material for optical components. The "NL-R1020" is a dry etching resistant grade essential for microfabrication, with a selectivity of 1.0 (Al2O3) and 0.6 (TiO2) proven. Various customizations are available to meet customer requirements. *For more details, please refer to the PDF materials or feel free to contact us.
- 企業：新中村化学工業 本社・和歌山工場
- 価格：Other
